Noah Hershkowitz

Irving Langmuir Professor

337 Engineering Research Building
1500 Engineering Drive
Madison, WI 53706

Ph: (608) 263-4970
Fax: (608) 265-2364
hershkowitz@engr.wisc.edu


Profile Summary

Professor Hershkowitz is an experimental plasma physicist with current research interests in plasma-aided manufacturng, basic plasma physics, plasma diagnostics and in in RF effects inprocessing and in fusion plasmas,. He is Director of tge Center for Plasma-Aided manufacturing (C-PAM) and of the Phaedrus laboratory for Plasma Science which investigate plasma applications and basic science issues associated with colder plasmas (about 3 eV) respectively.

C-PAM is investigating plasma etching, thin layer deposition and thick layer deposition using a large variety of plasma tools operating at pressures ranging from below 1mTorr to 1 atm. C-PAM also has a very extensive set of in-situ gas phase diagnostics. This Center is providing important input to U.S. industry.

Phaedrus studies curently include Bohm presheath physics and helicon wave studies.

Education

  • BS 1962, Physics, Union College (Schenectady, NY)
  • PhD 1966, Physics, Johns Hopkins University

Research Interests

  • plasma etching
  • plasm-aided manufacturing
  • basic plasma physics, ICRF effects
  • laboratory space plasma physics

Awards, Honors and Societies

  • Byron Bird Award for Excellence in Research Publication (1994)
  • IEEE Plasma Sciences and Applications Award (1993)
  • Nuclear & Plasma Sciences Merit Award (1987)
  • Fellow of the Institute of Electrical and Electronics Engineers (IEEE)
  • Fellow of the American Physical Society

Publications

  • Over 240

Courses

Fall 2016-2017

  • NE 890 - Pre-Dissertator\'s Research

Secondary Contact

Room 101
Computer Aided Engineering
1410 Engineering Drive
Madison, WI 53706

Alt Ph: (608) 265-2023

Profile Summary

Professor Hershkowitz is an experimental plasma physicist with current research interests in plasma-aided manufacturng, basic plasma physics, plasma diagnostics and in in RF effects inprocessing and in fusion plasmas,. He is Director of tge Center for Plasma-Aided manufacturing (C-PAM) and of the Phaedrus laboratory for Plasma Science which investigate plasma applications and basic science issues associated with colder plasmas (about 3 eV) respectively.

C-PAM is investigating plasma etching, thin layer deposition and thick layer deposition using a large variety of plasma tools operating at pressures ranging from below 1mTorr to 1 atm. C-PAM also has a very extensive set of in-situ gas phase diagnostics. This Center is providing important input to U.S. industry.

Phaedrus studies curently include Bohm presheath physics and helicon wave studies.


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